Electron suppression in a multicusp negative ion source

Multicusp Ion Source for Induction Linac Applications

At LBNL we are investigating the use of gaseous ion sources for induction linac applications such as heavy ion inertial fusion. Typical requirements for the ion source is to produce 20 μs pulses with a rise-time of 2 μs. The current density should be greater than 100 mA/cm2 at a duty cycle of 10 Hz [1]. Noble gases such as krypton, neon and xenon will be used. The source used for the measuremen...

Application of a Pulsed , RF - driven ) Multicusp Source for Low Energy Plasma Immersion Ion Implantation

The multicusp ion source has the capability of producing large volumes of uniform, quiescent, high density plasmas. Due to the versatility of the multicusp source, a plasma chamber suited for plasma immersion ion implantation (PIII) was readily constructed. Conventional PIII pulses the bias voltage applied to the substrate which is immersed in a CW mode plasma. However, in the interest of findi...

A pulsed sputter negative ion source

2014 A pulsed source for Cs-ions has been constructed as part of a sputter ion source in Hortig geometry. A beam of Cs-ions is extracted from a tungsten surface ionizer and bunched into pulses a few ns wide by a combination of velocity and path-of-flight modulation. It is expected that such a beam will produce intense pulses of negative ions having pulse widths in the ns range. REVUE DE PHYSIQU...

Electron Cyclotron Resonance Ion Source

Electron Cyclotron Resonance Ion Source